Laboratory, Optical And Precision Equipments (Excl. Glasses) – Elektronenstrahlverdampfer-System. For The Processing Of Semiconductor Laser Diodes As Part Of Research And Development, A Proven System For Electron Beam Evaporation (Esv) Must Be Procured. The Esv System Must Be Able To Deposit Thin Metal Layers For Material Lifting Processes (Lift-Off). The Esv System Must Be Able To Deposit Corresponding Layers At A Vapor Deposition Rate In The Range Of Angstroms Per Second. It Must Also Be Possible To Deposit The Corresponding Layers Very Homogeneously With A High Level Of Reproducibility. The Esv System Must Be Able To Carry Out Cleaning And Etching Processes In The Nanometer Range. Further Information Can Be Found In The Attached Service Description (Contract Documents).
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