Contract Award For Germany-Munich: Miscellaneous Special-Purpose Machinery 1 Piece Objec...

Contract Award Notice

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Contract Award For Germany-Munich: Miscellaneous special-purpose machinery 1 piece Object of procurement is a wet-chemical process plant for one-sided and two-sided machining of silicon wafers in the production of solar cells The system must be designed for fully automatic operation, ie the initial attachment of etch bikes, the transport of the wafers through the system, the post-dosing of spent chemicals and The emptying and rinsing of the system are carried out automatically and can be controlled via an operator panel Options: GT; 12 unneeded space should be equipped with the help of a displacement body to keep the amount of chemicals used as low as possible; 512 The transport speed is adjustable in the range between 1.1 m / min and 4 m / min (optionally also 0.2 m / min and 4 m / min) Gt; 513 There are two different transport speeds within the system, a one in the front area of the etching process and a rear area of the cleaning basins Gt; 514 The separation of both velocity areas should be depleased by small reconstruction measures (eg, to move a clutch) Gt; 1229 It is a one-time maintenance by the manufacturer to be offered shortly before the end of the warranty This position must be shown separately in the offer; 21 Saure Texturing GT; 2356 In the re-cleaning basin, a double ozone cleaning step is included, ie the sequence (O3 - HF - O3 - HF) (see Pos 188) GT; 3070 The rinsing water from the process area must not reach unhindered in the original tank, but is disposed of via a rinsing water pipe so it should be prevented that flushing water from the process area the chemistry dilute in the original tank Gt; 3286 The basin has an analog levele measurement in the upper process area (standing Wave) gt; 3287 Country value measurement GT; 33101 The basin has analog levelym measurement in the upper process area (standing wave) GT; 34118 The pelvis has analog levels in the upper process area (standing wave) gt; 34128 a metering device for additives from 5L or 10L canisters is to be offered GT; 35139 The basin has an analog level measurement in the upper process area (standing wave) GT; 36157 The basin has an analog levelu measurement in the upper process area (standing wave) gt; 36170 The basin is to be designed for a double cleaning process (see appendix) This position is to be shown separately in the offer; 40195 It is a device for oxidation of the dry wafers with the aid of gaseous ozone to be offered this position must be shown separately in the range Gt; 54 218 The system should previously provide defined data in data blocks in the PLC for reading Data may be, for example, bath temperatures, circulating speeds, valve states, heating / cooling states etc 219 The system must be equipped with an OPC UA server The data to be transmitted are coordinated with the Fraunhofer ISE 220 The system has its own SQL database with process data GT ; 60229 The system has a mirrored hard disk system to Automatically bridge a hard disk defect Alternatively, a mirroring / backup via mobile disk is possible gt; 66246 This interface is to be expanded in that the specific requirements of the system concept defined herein fulfilled for systems with automated carrier loading and unloading system with respect to the virtual material tracking will (cf. pos 75) the details are to be developed with the client in a separate specification gt; 71256 The amount of the disposed of HF-containing media is detected by the system

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